Atomic Layer Deposition for Piezoelectric and Ferroelectric Device Performance

About the Research

Materials processing such as atomic layer deposition, deep silicon etching, chemical etching, & thermal treatments; materials characterization using scanning electron microscopy, & x-ray diffraction and electrical characterization to achieve structure and component uniformity in optimized piezoelectric and ferroelectric test devices.

Keywords

• atomic layer deposition
• materials
• characterization
• testing
• piezoelectric
• ferroelectric
• device optimization

About SEDD

The Sensors and Electron Devices Directorate (SEDD) is the Army’s principal center for research and development in the exploration and exploitation of the electromagnetic spectrum, which includes radio frequency, microwave, millimeter-wave, infrared (IR), visible, and audio regions. SEDD is responsible for advances in laser sources, RF sources, IR sensors, signature detection and decoding, target imaging and its interpretation, fusion of data derived from several sensors, and electromagnetic protection.

In addition, SEDD is responsible for improving the technology base for electron devices and materials related to sensors and power devices. Research is conducted in related aspects of physics, electrical engineering, computer science, solid-state physics, chemical engineering, material sciences, and electrochemistry.

About ARL-RAP

The Army Research Laboratory Research Associateship Program (ARL-RAP) is designed to significantly increase the involvement of creative and highly trained scientists and engineers from academia and industry in scientific and technical areas of interest and relevance to the Army. Scientists and Engineers at the CCDC Army Research Laboratory (ARL) help shape and execute the Army's program for meeting the challenge of developing technologies that will support Army forces in meeting future operational needs by pursuing scientific research and technological developments in diverse fields such as: applied mathematics, atmospheric characterization, simulation and human modeling, digital/optical signal processing, nanotechnology, material science and technology, multifunctional technology, combustion processes, propulsion and flight physics, communication and networking, and computational and information sciences.

A complete application includes:

• Curriculum Vitae or Resume
• Three References Forms
• Transcripts

If selected by an advisor the participant will also be required to write a research proposal to submit to the ARL-RAP review panel for:

• Research topic should relate to a specific opportunity at ARL (see Research Areas)
• The objective of the research topic should be clear and have a defined outcome
• Explain the direction you plan to pursue
• Include expected period for completing the study
• Include a brief background such as preparation and motivation for the research
• References of published efforts may be used to improve the proposal

Questions about this opportunity? Please email ARLFellowship@orau.org

Requirements

• Citizenship: U.S. Citizen Only
• Degree: Associate's Degree or Bachelor's Degree.
• Academic Level(s): Any academic level.
• Discipline(s): Engineering (2 )