Metrology Engineer

About the role

NY Creates serves as a bridge for advanced electronics, leads projects that advance R&D in emerging technologies, and generates the jobs of tomorrow. NY Creates also runs some of the most advanced facilities in the world, boasts more than 3,000 industry experts and faculty, and manages public and private investments of more than $25 billion - placing it at the global epicenter of high-tech innovation and commercialization.

Responsibilities

• Develop, implement, and optimize metrology strategies for High-NA EUV lithography processes
• Characterize critical dimension (CD), overlay, line edge roughness (LER), and stochastic defects at advanced nodes
• Evaluate and deploy cutting-edge metrology tools (e.g., CD-SEM, scatterometry, actinic inspection, e-beam inspection)
• Collaborate with lithography and process teams to understand EUV resist behavior, exposure variability, and pattern fidelity
• Analyze large datasets to identify process trends, variability sources, and yield-impacting issues
• Drive continuous improvement in measurement accuracy, precision, and throughput
• Work closely with equipment vendors to qualify and optimize metrology tools for High-NA EUV applications
• Develop automated data analysis pipelines and reporting dashboards
• Contribute to technical documentation, best practices, and knowledge sharing

Requirements

• Bachelor's, Master's, or PhD in Electrical Engineering, Materials Science, Physics, or related field
• 7+ years (BS) or 5+ years (MS) or 1-3 years (PhD) of experience in semiconductor metrology or lithography
• Strong understanding of EUV lithography fundamentals and challenges (e.g., stochastic effects, photon shot noise, resist chemistry)
• Experience with data analysis tools (Python, MATLAB, JMP, or similar)
• Knowledge of statistical process control (SPC) and data-driven problem solving
• Strong analytical, troubleshooting, and communication skills
• Hands-on experience with semiconductor metrology tools such as: CD-SEM, Optical CD (OCD) / Scatterometry, Overlay metrology systems

Preferred Qualifications

• In-depth knowledge of EUV/High NA EUV lithography, mask technologies, and defect inspection
• Familiarity with advanced patterning techniques (e.g., multi-patterning, self-aligned processes)
• Experience with stochastic defect analysis and mitigation strategies
• Exposure to machine learning applications in metrology or process control
• Strong communication skills, ability to work in a team, and ability to lead in a fast-paced R&D environment